Handbook of Chemical Vapor Deposition: Principles, Technology and Applications - Pierson, Hugh O. (Sandia National Laboratories (retired)) - Books - William Andrew Publishing - 9780815514329 - December 31, 1999
In case cover and title do not match, the title is correct

Handbook of Chemical Vapor Deposition: Principles, Technology and Applications 2nd edition

Pierson, Hugh O. (Sandia National Laboratories (retired))

Price
Íkr 35,239
excl. VAT

Ordered from remote warehouse

Expected delivery Oct 15 - 28

Our customers say:

14-day return policy in accordance with European consumer protection law
Top ranking on Trustpilot
Add to your iMusic wish list

Also available as:

Handbook of Chemical Vapor Deposition: Principles, Technology and Applications 2nd edition

Offers an understanding of the advances in the Chemical Vapor Deposition (CVD) process. This book features data on both Plasma CVD and metallo-organic CVD processes. It also explains growing importance of CVD in production of semiconductor and related applications.

506 pages

Media Books     Hardcover Book   (Book with hard spine and cover)
Released December 31, 1999
ISBN13 9780815514329
Publishers William Andrew Publishing
Pages 506
Dimensions 164 × 237 × 40 mm   ·   843 g
Language English  
Show all

More by Pierson, Hugh O. (Sandia National Laboratories (retired))

See all of Pierson, Hugh O. (Sandia National Laboratories (retired)) ( e.g. Hardcover Book )